Ultraprecise Position Tracking
Application/Challenge:
During the photolithography process circuit patterns of
few nanometers in size are transferred from the photomask
(reticle) via various lenses onto the semiconductor wafer.
After the photomask pattern is projected to one part of
the wafer, the wafer stage is moved and the lithography
process is repeated until the whole wafer is covered with the
respective patterns.
The ultraprecise position tracking and alignment of
measurement frame, optics and wafer stage is key
condition to ensure highest quality throughout the
lithography process. All components used in this process
need to meet the requirements of clean room conditions
and - depending on the technology - be capable to perform
under vacuum and high temperature environments.
attocube’s Solution:
attocube´s laser interferometer IDS3010 with vacuum
and high temperature compatible sensor heads can be
easily integrated into lithography machines, ensuring
the best alignment among the key components with
nanometer accuracy, delivering high speed data with up
to 10 MHz bandwidth.
Product:
Displacement Sensor IDS3010
• 10 MHz bandwidth
• 2 m/s target velocity
• real-time
Sensor Heads
• vacuum compatible
• pluggable
• compatible with
different targets