Semicon
Challenge:
attocube ´ s solution:
Benefits:
Semicon
Challenge:
Electron Beam Aperture Positioning
Electron-beam systems are widely used in scientific and industrial applications, particularly in semiconductor lithography and defect inspection. They offer the highest resolution for small structures but suffer from low throughput. Multi-stencil character projection can improve throughput, but its complexity demands nano-precise alignment in ultra-high vacuum and elevated temperatures.
attocube ´ s solution:
Besides highest precision, attocube’ s nanopositioners fit well with the required harsh environments. The positioners are suitable for pressures down to 5 x 10-11 mbar, extreme temperatures and offer clean room compatibility. Furthermore, the compact design allows facilitated integration of single positioners or multi-axis motion systems.
Benefits:
• nanometer precision
• UHV compatibility up to 5 x 10-11 mbar
• bake out up to 150 ° C stability