Semicon
Challenge:
attocube ´ s solution:
Benefits:
Semicon
Beam Aperture & Filter Positioning
Challenge:
In lithography and optical metrology, precise alignment and filtering of EUV light are crucial for wafer quality. High-energy photons from the laser source are collected by a gathering mirror and shaped through apertures and filters to accurately interact with components like the reflection mask. The short wavelength and high energy of EUV light demand exceptional precision to meet semiconductor manufacturing standards.
attocube ´ s solution:
attocube’ s piezo positioners provide nanometer precision and are fully compatible with UHV and high-temperature environments, making them ideal for the precise alignment and filtering of EUV light. Their reliability under extreme conditions ensures optimal beam control for advanced lithography and metrology applications.
Benefits:
• nanometer precision
• UHV compatibility down to 5 x 10-11 mbar
• coarse & fine movement www. attocube. com