Cutting-edge
Systems
PAGE 168
Low Temperature Photolithography
selected applications for cryogenic confocal microscopy
Laser
750 nm
PL signal
Laser
532 nm
Objective
Resist
layer
QDs
(Scheme courtesy of Pascale Senellart, LPN, CNRS, Paris,France)
Optical image of an in-situ lithography pattern
centred on a single QD (see [4] for details)
Very sophisticated new techniques in device fabrication have greatly
benefited from the possibility of cryogenic in-situ optical lithography. For
example, to manufacture microcavities around single quantum dots, an
appropriate photoresist has to be exposed while the luminescence signal
of thos